Composition of Tungsten Silicide Films Deposited by Dichlorosilane Reduction of Tungsten Hexafluoride
- 1 September 1990
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 137 (9) , 2955-2959
- https://doi.org/10.1149/1.2087105
Abstract
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