Effect of TiB2 interlayer on the CVD of an amorphous titanium
- 30 April 1982
- journal article
- other
- Published by Elsevier in Journal of Crystal Growth
- Vol. 57 (2) , 456-458
- https://doi.org/10.1016/0022-0248(82)90505-x
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Ultrasonic chemical vapor deposition of TiB2 thick filmsJournal of Crystal Growth, 1980
- Chemical Vapor Deposition of Titanium Nitride on Iron in an Ultrasonic FieldJournal of the Electrochemical Society, 1977