A new class of positive electron beam resists: methyl methacrylate-styrene and butyl methacrylate-styrene comb copolymers
- 31 August 1988
- Vol. 29 (8) , 1407-1411
- https://doi.org/10.1016/0032-3861(88)90303-5
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Polymer degradation in reactive-gas plasmasPolymer Degradation and Stability, 1987
- Radical copolymerization of acrylic monomers: 10. Copolymerization of ortho-methacryloyloxybenzoic acid with methyl methacrylate and vinyl chloridePolymer, 1987
- Copolymer electron resists: poly(stryene-methyl methacrylate) copolymersPolymer, 1983