Hollow-cathode sputtering source for the production of gas-phase metal atoms of the refractory elements
- 10 December 1982
- journal article
- Published by Elsevier in Chemical Physics Letters
- Vol. 93 (4) , 345-349
- https://doi.org/10.1016/0009-2614(82)83706-8
Abstract
No abstract availableKeywords
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