Directed ion beam sputter etching of polytetrafluoroethylene (Teflon) using an argon ion source
- 1 September 1982
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 95 (4) , 351-362
- https://doi.org/10.1016/0040-6090(82)90041-4
Abstract
No abstract availableThis publication has 2 references indexed in Scilit:
- Ion-beam-sputter modification of the surface morphology of biological implantsJournal of Vacuum Science and Technology, 1977
- Problems related to the maintenance of chronic percutaneous electronic leadsJournal of Biomedical Materials Research, 1971