Magnetron ion etching of InP using mixture of methane and hydrogen and its comparison with reactive ion etching
- 1 July 1991
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 9 (4) , 1911-1919
- https://doi.org/10.1116/1.585379
Abstract
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