Effect of Ultraviolet Irradiation on Silicon Oxide Films Prepared by Radio Frequency Plasma‐Enhanced Chemical Vapor Deposition
- 1 August 1997
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 144 (8) , 2824-2828
- https://doi.org/10.1149/1.1837901