Optimization of DUV Negative Resists for 0.15 .MU.m Lithography.

• 1 January 1998
• journal article
• Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
• Vol. 11  (3) , 445-454
• https://doi.org/10.2494/photopolymer.11.445

Abstract

Keywords

• NEGATIVE RESISTS
• MU.M LITHOGRAPHY
• DUV NEGATIVE
• OPTIMIZATION OF DUV