Temperature dependence of formation of a supported phospholipid bilayer from vesicles onSiO2

Abstract
Adsorption of egg-phosphatidylcholine vesicles and bilayer formation on a SiO2 surface was investigated in the temperature range 278–303 K using the quartz crystal microbalance-dissipation technique. The critical coverage for the vesiclebilayer transition is found to decrease with increasing temperature. The temperature dependence of the time-scale characterizing this transition can be represented in the Arrhenius form. Higher temperatures produce a bilayer with fewer trapped, nonruptured vesicles.