In situ formation of diffusion barriers in thin film metallization systems
- 1 June 1976
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 35 (1) , L13-L16
- https://doi.org/10.1016/0040-6090(76)90233-9
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- On Chemical Cleaning for Thermocompression BondingIEEE Transactions on Parts, Hybrids, and Packaging, 1975
- Thin film metallization of oxides in microelectronicsThin Solid Films, 1973
- Analysis of surface composition with low-energy backscattered ionsSurface Science, 1971