Improved method for measuring low-level linear birefringence in optical materials

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Abstract
The authors reports in this paper a sensitive method for measuring low-level linear birefringence in optical materials. A photoelastic modulator is employed as the polarization modulation device in the set-up. The sensitivity of this method is evaluated to be at approximately 0.003 nm (approximately 0.002 degree(s) at 632.8 nm) by measuring the mechanically induced linear birefringence in a fused silica optical element. The capability of this method is demonstrated by determining the residual linear birefringence below 0.1 nm in several high quality optical elements.

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