Optical and bonding model for non-crystalline SiOx and SiOxNy materials
- 1 June 1972
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 8-10, 627-632
- https://doi.org/10.1016/0022-3093(72)90202-5
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
- Characterization of Silicon Nitride FilmsJournal of the Electrochemical Society, 1971
- The structure of amorphous silicon nitride filmsPhysica Status Solidi (b), 1968
- The Structure of Silicon Oxide FilmsPhysica Status Solidi (b), 1967
- Optical transitions in crystalline and fused quartzSolid State Communications, 1966
- Zur Kenntnis der SiO- und Si 2 O 3 -Phase in Dünnen SchichtenOptica Acta: International Journal of Optics, 1962
- Helium Diffusion Through GlassJournal of the American Ceramic Society, 1953
- Preparation, Structure, and Applications of Thin Films of Silicon Monoxide and Titanium DioxideJournal of the American Ceramic Society, 1950