Hot embossing in polymers as a direct way to pattern resist
- 1 March 1998
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 41-42, 575-578
- https://doi.org/10.1016/s0167-9317(98)00135-x
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Imprint lithography with sub-10 nm feature size and high throughputMicroelectronic Engineering, 1997
- Properties of thin anti-adhesive films used for the replication of microstructures in polymersMicroelectronic Engineering, 1997
- Lithography beyond light: Microcontact printing with monolayer resistsIBM Journal of Research and Development, 1997
- Imprint Lithography with 25-Nanometer ResolutionScience, 1996
- Giant magnetoresistance in magnetic multilayered nanowiresApplied Physics Letters, 1994
- Ellipsometric study of the glass transition and thermal expansion coefficients of thin polymer filmsJournal of Polymer Science Part B: Polymer Physics, 1993
- Influence of solvent and molecular weight on thickness and surface topography of spin‐coated polymer filmsPolymer Engineering & Science, 1990
- Elektronenmikroskopische Oberflächenabdrücke und ihr AuflösungsvermögenThe Science of Nature, 1966