Complete wetting of a rough surface: An x-ray study
- 22 April 1991
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 66 (16) , 2108-2111
- https://doi.org/10.1103/physrevlett.66.2108
Abstract
The evolution of the surface structure of a wetting film on a rough surface as a function of the film thickness has been studied by x-ray specular reflection and surface diffusion scattering. For thin films (≲60 Å) the liquid surface is characterized by static undulations induced by the roughness of the substrate; however, with increasing film thickness the structure is dominated by thermally induced capillary waves. The data are quantitatively described by a model with exclusively van der Waals liquid-substrate interactions.Keywords
This publication has 17 references indexed in Scilit:
- Thin liquid films on rough or heterogeneous solidsPhysical Review A, 1991
- Experiments on wetting on the scale of nanometers: Influence of the surface energyPhysical Review Letters, 1990
- Adsorption and Wetting Transitions on Rough SubstratesEurophysics Letters, 1990
- Reentrant first-order layering transitions in multilayer argon films on graphitePhysical Review Letters, 1990
- Surfactants in epitaxial growthPhysical Review Letters, 1989
- The effects of substrate roughness on ultrathin water filmsThe Journal of Chemical Physics, 1989
- Multilayer adsorption on a fractally rough surfacePhysical Review Letters, 1989
- Complete Wetting on Rough Surfaces: StaticsEurophysics Letters, 1988
- Wetting: statics and dynamicsReviews of Modern Physics, 1985
- Observation of Surface MeltingPhysical Review Letters, 1985