Nanostructure fabrication by electron beam lithography on insulating substrates using a novel four-layer resist
- 1 March 1991
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 13 (1-4) , 225-228
- https://doi.org/10.1016/0167-9317(91)90083-p
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Application of titanium RIE to the fabrication of nm-scale structuresMicroelectronic Engineering, 1986
- Twenty-five nm features patterned with trilevel e-beam resistJournal of Vacuum Science and Technology, 1981
- Point-contact spectroscopy in metalsJournal of Physics C: Solid State Physics, 1980