Concurrent deployment of run by run controller using SCC framework
- 30 December 2002
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
The Run by Run (RbR) Controller is a model-based control system which provides a framework for controlling semiconductor manufacturing processes subject to disturbances such as shifts and drifts as a normal part of their operation. The RbR Controller has been applied successfully to a technically matured epitaxy process at AT&T Microelectronics, Allentown, PA, and has demonstrated major improvements over the results from standard process control methods in the fab. However, the development of the process models for model-based controller can be time consuming and expensive if done on-site, interrupting the production. To overcome this problem, the RbR Controller is being deployed concurrently on the chemical-mechanical polishing (CMP) process in development at Fairchild Research Center at National Semiconductor Corporation (NSC). The concurrent deployment of the RbR Controller during the CMP development phase includes development of the process model, testing RbR control of the process, and establishing equipment-Controller computer interfaces.<>Keywords
This publication has 7 references indexed in Scilit:
- Run-by-run process control: performance benchmarksPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2003
- The development and implementation of a cell controller frameworkPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2002
- Characterization of mechanical planarization processesPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2002
- Run by run process control: combining SPC and feedback controlIEEE Transactions on Semiconductor Manufacturing, 1995
- Open architecture for computer-aided control engineeringIEEE Control Systems, 1993
- Integration of chemical-mechanical polishing into CMOS integrated circuit manufacturingThin Solid Films, 1992
- Application of Chemical Mechanical Polishing to the Fabrication of VLSI Circuit InterconnectionsJournal of the Electrochemical Society, 1991