Reactive Ion Etching of Sputter Deposited Tantalum Oxide and Its Etch Selectivity to Tantalum

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1 February 1992

journal article
Published by The Electrochemical Society in Journal of the Electrochemical Society

Vol. 139 (2) , 579-583
https://doi.org/10.1149/1.2069261

Abstract

No abstract available

Keywords

REACTIVE ION ETCHING

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