Molecular-dynamics studies on defect-formation processes during crystal growth of silicon from melt
- 15 November 1998
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 58 (19) , 12583-12586
- https://doi.org/10.1103/physrevb.58.12583
Abstract
We have performed molecular-dynamics calculations to examine defect-formation processes in silicon grown from the melt based on the ordinary Langevin equation employing the Tersoff interatomic potential. Our simulations indicated that hexagonal structures are formed near the solid-liquid interfaces and these regions give rise to microfacets composed of primarily {111} planes. Most of these hexagonal configurations were annihilated during further crystal growth, but a part of them were left, which resulted in defect formation with five- and seven-member rings.Keywords
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