Texture characterisation of sputtered MoS2thin films by cross-sectional TEM analysis
- 14 May 1990
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 23 (5) , 624-626
- https://doi.org/10.1088/0022-3727/23/5/026
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Orientation of rf-sputter-deposited MoS2 filmsJournal of Materials Research, 1989
- Fundamental aspects of the electronic structure, materials properties and lubrication performance of sputtered MoS2 filmsThin Solid Films, 1987
- Preparation and properties of different types of sputtered MoS2 filmsWear, 1987
- A neglected parameter (water contamination) in sputtering of MoS2 filmsThin Solid Films, 1986