Surface reactions of radicals during deposition of amorphous semiconductors by photochemical decomposition of molecular hydrides
- 1 December 1987
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 97-98, 261-264
- https://doi.org/10.1016/0022-3093(87)90062-7
Abstract
No abstract availableKeywords
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