Modeling of Growth Processes in Epitaxial Reactors

• 1 March 1998
• journal article
• Published by Trans Tech Publications, Ltd. in Materials Science Forum
• Vol. 276-277, 135-152
• https://doi.org/10.4028/www.scientific.net/msf.276-277.135

Abstract

Keywords

• CHEMICAL VAPOR DEPOSITION (CVD)
• EPITAXY
• LOW-PRESSURE CVD
• MATHEMATICAL MODELS
• MOCVD
• PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION
• SURFACE KINETICS