Electron-spin-resonance analysis of the natural intrinsicEXcenter in thermalon Si
- 15 February 1995
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 51 (8) , 4987-4997
- https://doi.org/10.1103/physrevb.51.4987
Abstract
An electron-spin-resonance (ESR) analysis of the natural EX defect in thermal on Si is presented. Its ESR spectrum consists of a central line amid a doublet of 16.1-G splitting. The Voigt shape of the central line is deconvoluted into a Lorentzian part originating from dipole-dipole interaction, and a residual Gaussian part, likely inhomogeneously broadened due to unresolved hyperfine interaction and/or a spread in the defect’s g factor. The 16.1-G doublet is found to arise from the hyperfine interaction of the unpaired spin with three-or four equivalent Si sites, at first- or higher-order nearest-neighbor positions. The saturation behavior as well as the temperature (T) dependence of various ESR parameters of the EX signal are investigated: g and Δ are found to be T independent in the range 4.3–77 K, while the behavior of the EX susceptibility indicates a weak ferromagnetic coupling at low T. It is outlined that the EX defect is not related to any known class of defects in a-, including , E’, the oxygen hole centers, and the self-trapped holes, nor can it be correlated with overcoordinated or undercoordinated O atoms. A preliminary model pictures EX as an unpaired electron delocalized over several atomic sites.
Keywords
This publication has 43 references indexed in Scilit:
- Structural relaxation of defects at the (111)Si/ interface as a function of oxidation temperature: The -generation–stress relationshipPhysical Review B, 1993
- Characterization of Si/SiO2 interface defects by electron spin resonanceProgress in Surface Science, 1983
- center in glassy Si:,, and "very weak"superhyperfine structurePhysical Review B, 1980
- ESR centers, interface states, and oxide fixed charge in thermally oxidized silicon wafersJournal of Applied Physics, 1979
- center in glassy Si: Microwave saturation properties and confirmation of the primaryhyperfine structurePhysical Review B, 1979
- Electronic structure ofcenters in SiPhysical Review B, 1975
- Observation and analysis of the primary 29Si hyperfine structure of the E′ center in non-crystalline SiO2Solid State Communications, 1974
- Oxygen vacancy model for the E1′ center in SiO2Solid State Communications, 1974
- Study of Silicon-Silicon Dioxide Structure by Electron Spin Resonance IJapanese Journal of Applied Physics, 1971
- Paramagnetic Resonance of Lattice Defects in Irradiated QuartzJournal of Applied Physics, 1956