Conditions for the formation of new oxide within oxide films growing on metals
- 31 December 1982
- journal article
- Published by Elsevier in Corrosion Science
- Vol. 22 (4) , 347-357
- https://doi.org/10.1016/0010-938x(82)90035-x
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Some observations on void formation in Fe3O4 layers on FeCorrosion Science, 1981
- The diffusion of63Ni along grain boundaries in nickel oxidePhilosophical Magazine A, 1981
- On High Temperature Oxidation of Chromium: I . Oxidation of Annealed, Thermally Etched Chromium at 800°–1100°CJournal of the Electrochemical Society, 1980
- Simulation of the structure of vacancies in high angle grain boundariesScripta Metallurgica, 1980
- The Relationship Between Oxide Grain Morphology and Growth Mechanisms for Fe‐Cr‐Al and Fe‐Cr‐Al‐Y AlloysJournal of the Electrochemical Society, 1979
- The generation of stresses in oxide films growing by cation diffusionActa Metallurgica, 1978
- Vacancy injection during oxidation—A re-examination of the evidenceActa Metallurgica, 1978
- Point defect diffusion and oxidation kinetics. Part IOxidation of Metals, 1973
- Stress generation and relief in growingoxide filmsCorrosion Science, 1970
- The role of oxide microstructure and growth stresses in the high-temperature scaling of nickelMetallurgical Transactions, 1970