Profile modification of resist patterns in optical lithography
- 1 December 1983
- journal article
- research article
- Published by Wiley in Polymer Engineering & Science
- Vol. 23 (17) , 925-930
- https://doi.org/10.1002/pen.760231702
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- UV hardening of photo- and electron beam resist patternsJournal of Vacuum Science and Technology, 1981
- Deep UV 1:1 projection lithography utilizing negative resist MRSIEEE Transactions on Electron Devices, 1981