Helium deposition profiles from self-shielded alpha sources

1 January 1982

journal article
research article
Published by Taylor & Francis in Radiation Effects

Vol. 66 (3) , 211-216
https://doi.org/10.1080/00337578208222480

Abstract

The use of ²³⁸Pu and ²⁴⁴Cm alpha sources for helium deposition into thin foils leads to different concentration profiles than are obtained with ion accelerators. The major differences arise due to isotropic emission in the source as opposed to normal incidence beams, and also due to self-shielding within the source. Using a source-target sandwich technique for typical pre-thinned foil applications leads to deposition profiles which are completely uniform, and also yields a substantial saving in time, effort and money compared to other alpha implantation techniques.

Keywords

This publication has 2 references indexed in Scilit:

Injecting Irradiation Samples with a Uniform Concentration of Helium Using Curium-244
Nuclear Technology, 1978
Effective Alpha Activity and Self-Absorption Alpha Range in238PuO2Microspheres
Nuclear Applications and Technology, 1970