Mechanism of Resist Pattern Collapse
Open Access
- 1 July 1993
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 140 (7) , L115-L116
- https://doi.org/10.1149/1.2220782
Abstract
In this paper, the mechanism of resist pattern collapse during the resist development process is investigated by the use of atomic force microscope measurement of a pattern in the rinse liquid. The resist pattern collapse occurs during the rinse liquid is dried off, and the cause of collapse is the capillary force of the rinse liquid.Keywords
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