Technology of Intense dc Ion Beams

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Abstract
The present status of a program directed toward the improvement of ion sources and the technology of intense dc ion beams is described. The work is in the energy range of from 20–600 keV at currents of up to 1 A. Several factors have differentiated the approach from that existing in some other areas of ion beam research. There are severe cooling problems in the ion source and in beam targets. Grids cannot be used in the electrode system, and many of the techniques which have been used to study detailed emittance shapes are very difficult to utilize because of these thermal problems. On the other hand, it is possible to accumulate electrons in these dc beams to eliminate the dispersive effect of space charge. Pulsed beams with on‐times of less than a few hundred microseconds ordinarily are completely unneutralized. Ion sources are described which are especially suited to proton production and to molecular ion production at source arc currents of up to 50 A. Single gap accelerating and focusing arrangements are described. A special configuration prevents electron trapping and subsequent break‐down in the combined electric and magnetic fields.

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