Synthesis, characterization, and properties of photosensitive silicon‐containing copolyimides
- 1 January 1990
- journal article
- Published by Wiley in Journal of Applied Polymer Science
- Vol. 41 (3-4) , 877-888
- https://doi.org/10.1002/app.1990.070410331
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Toughness of silicone block copolyimidesIndustrial & Engineering Chemistry Research, 1987
- Preparation of positive photoreactive polyimides and their characterizationJournal of Applied Polymer Science, 1987
- Polyimide Adhesion: Mechanical and Surface Analytical CharacterizationJournal of the Electrochemical Society, 1985
- Thermal stability of the silica-aminopropylsilane-polyimide interfaceJournal of Polymer Science: Polymer Chemistry Edition, 1984
- Effect of pH of silane solution on the adhesion of polyimide to a silica substrateJournal of Applied Polymer Science, 1984
- Preparation and characterization of siloxane-containing thermoplastic polymidesInternational Journal of Adhesion and Adhesives, 1984
- Preparation of silicon‐containing polymers. I. Polyimides from dianhydrides and organosilicon diisocyanatesJournal of Polymer Science: Polymer Chemistry Edition, 1983
- New Coupling Method for Polyimide Adhesion to LSI SurfaceJournal of the Electrochemical Society, 1982
- Thermally stable photoresist polymerPolymer Engineering & Science, 1971
- Siloxanmodifizierte polypyromellitimideDie Makromolekulare Chemie, 1966