Diamond growth on silicon nitride by microwave plasma chemical vapor deposition
- 1 May 1992
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 1 (7) , 818-823
- https://doi.org/10.1016/0925-9635(92)90107-y
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- The Effect of a Graphite Holder on Diamond Synthesis by Microwave Plasma Chemical Vapor DepositionJournal of the Electrochemical Society, 1992
- Foreign Object Damage Resistance of Silicon Nitride and Silicon CarbideJournal of the American Ceramic Society, 1990
- Particle Impact Damage in Silicon NitrideJournal of the American Ceramic Society, 1990
- Characterization of crystalline quality of diamond films by Raman spectroscopyApplied Physics Letters, 1989
- Ceramic coatings on ceramic for improved oxidation-corrosion resistanceSurface and Coatings Technology, 1988
- Synthesis of diamonds by use of microwave plasma chemical-vapor deposition: Morphology and growth of diamond filmsPhysical Review B, 1988
- Effects of filament and reactor wall materials in low-pressure chemical vapor deposition synthesis of diamondApplied Physics Letters, 1988
- Effects of Oxygen on CVD Diamond SynthesisJapanese Journal of Applied Physics, 1987
- Diamond synthesis from gas phase in microwave plasmaJournal of Crystal Growth, 1983
- Vapor Deposition of Diamond Particles from MethaneJapanese Journal of Applied Physics, 1982