Interactions of Thin Al Films with Ni–Cr Alloy and Bilayer Films Deposited on Si
- 16 March 1986
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 94 (1) , 61-69
- https://doi.org/10.1002/pssa.2210940106
Abstract
No abstract availableKeywords
This publication has 18 references indexed in Scilit:
- Phase separation and layer sequence reversal during silicide formation with Ni-Cr alloys and Ni-Cr bilayersJournal of Applied Physics, 1984
- Solid state reactions of TaW thin films and Si single crystalsVacuum, 1983
- Suicide Formation Resulting from the Interfacial Reaction of Silicon and Thin Films of Ir–V Alloys and BilayersPhysica Status Solidi (a), 1982
- Formation of shallow silicide contacts of high Schottky barrier on Si: Alloying Pd and Pt with W versus alloying Pd and Pt with SiJournal of Applied Physics, 1982
- Schottky contacts of Gd-Pt and Gd-V alloys on n-Si and p-SiJournal of Applied Physics, 1981
- Shallow and parallel silicide contactsJournal of Vacuum Science and Technology, 1981
- Shallow silicide contactJournal of Applied Physics, 1980
- Contact reaction between Si and Pd-W alloy filmsJournal of Applied Physics, 1979
- Silicide formation with Pd-V alloys and bilayersJournal of Applied Physics, 1979
- Cobalt silicide layers on Si. I. Structure and growthJournal of Applied Physics, 1975