Nuclear resonance profiling of high dose implants of Al in Si
- 1 March 1985
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 7-8, 357-360
- https://doi.org/10.1016/0168-583x(85)90581-6
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Limits of composition achievable by ion implantationJournal of Vacuum Science and Technology, 1978
- Anomalously high collection of copper ions implanted in aluminiumPhysica Status Solidi (a), 1971