Some Properties of a Novel Far UV Xenon Excimer Barrier Discharge Light Source
- 1 January 1995
- journal article
- research article
- Published by Wiley in Contributions to Plasma Physics
- Vol. 35 (1) , 15-22
- https://doi.org/10.1002/ctpp.2150350103
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Modification of surfaces with new excimer UV sourcesThin Solid Films, 1992
- Transient 210-nm absorption in fused silica induced by high-power UV laser irradiationOptics Letters, 1991
- Generation of excimer emission in dielectric barrier dischargesApplied Physics B Laser and Optics, 1991
- UV‐Generation in Dielectric Barrier DischargesContributions to Plasma Physics, 1991
- Characteristics of electron-beam-excited Xe*2 at low pressures as a vacuum ultraviolet sourceJournal of Applied Physics, 1988
- UV excimer radiation from dielectric-barrier dischargesApplied Physics B Laser and Optics, 1988
- Ozone synthesis from oxygen in dielectric barrier dischargesJournal of Physics D: Applied Physics, 1987
- Defect structure and formation mechanism of drawing-induced absorption at 630 nm in silica optical fibersJournal of Applied Physics, 1986