Study on the electrochromic mechanism of rf diode sputtered nickel oxide films

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Abstract
This paper gives the experimental evidences to establish a new electrochromism for the nickel oxide films deposited by rf reactive sputtering. ESCA results indicate that all the films in as-deposited, coloured and bleached states are nonstoichiometric nickel oxide with different oxidation states and there is no evidence to support the exitance of nickel hydroxide in the three states. SIMS has been used to analyze the injected Li+ concentration in these films. The relative content of Li in films is 0 for as-deposited, 1.3 for coloured and 4.0 for bleached. Li+ implantation has been used to initially bleach the dark as-deposited films. The results indicate that the as-deposited films can be bleached by Li+ implantation. A new electrochromic reaction model for the reactively sputtered nickel oxide films has been proposed.

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