Lifetime enhancement of a multicusp ion source for lithography
- 31 March 1998
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 41-42, 241-244
- https://doi.org/10.1016/s0167-9317(98)00055-0
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Ion energy spread and current measurements of the rf-driven multicusp ion sourceReview of Scientific Instruments, 1997
- Production of low energy spread ion beams with multicusp sourcesNuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 1996
- Beam diagnostic techniques for a small-size high-efficiency radio-frequency ion sourceReview of Scientific Instruments, 1995