Recent Progress of Liquid Source Misted-Chemical Deposition System for Ferroelectric Materials
- 1 January 2004
- journal article
- Published by Taylor & Francis in Integrated Ferroelectrics
- Vol. 62 (1) , 129-132
- https://doi.org/10.1080/10584580490456182
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Use of the ‘mist’ (liquid-source) deposition system to produce new high-dielectric devices: ferroelectric-filled photonic crystals and Hf-oxide and related buffer layers for ferroelectric-gate FETsMicroelectronic Engineering, 2003
- Liquid source misted chemical deposition (LSMCD)–a critical reviewIntegrated Ferroelectrics, 1995
- Ultrasonic Atomization of LiquidsThe Journal of the Acoustical Society of America, 1962