Fundamental aspects of plating technology I: The determination of the optimum deposition current density
- 30 November 1983
- journal article
- Published by Elsevier in Surface Technology
- Vol. 20 (3) , 199-202
- https://doi.org/10.1016/0376-4583(83)90003-1
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Some aspects of current density distribution in electrolytic cells I: Dendritic growth of cadmium at the cathode edge in galvanostatic electrodepositionSurface Technology, 1983
- The effect of the overpotential of deposition on the porosity of metal depositsJournal of Applied Electrochemistry, 1977
- The effect of pulsating potential electrolysis on the porosity of metal depositsJournal of Applied Electrochemistry, 1976
- Surface processes in electrocrystallizationContemporary Physics, 1967