Solution precursor chemical vapor deposition of titanium oxide thin films
Open Access
- 1 September 1991
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 204 (1) , L13-L17
- https://doi.org/10.1016/0040-6090(91)90488-j
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Titanium dioxide dielectric films formed by rapid thermal oxidationJournal of Applied Physics, 1989
- Algorithms for the rapid simulation of Rutherford backscattering spectraNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- Structural properties of titanium dioxide films deposited in an rf glow dischargeJournal of Vacuum Science & Technology A, 1983