Micro-Raman Spectroscopy Investigation of Nickel Silicides and Nickel (Platinum) Silicides

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Abstract
The formation of silicides has been successfully monitored by Raman spectroscopy. silicides formed at different annealing temperatures using rapid thermal annealing were analyzed using Rutherford backscattering spectroscopy and X‐ray diffraction. Raman spectroscopy was further used to examine these samples. The results showed that Raman spectroscopy could accurately identify the phases of silicides formed at various temperatures. These findings were used to demonstrate the increased thermal stability of by the addition of . This study demonstrates the applicability of Raman spectroscopy for monitoring the formation of . which was suggested to be the future silicide for deep submicrometer integrated circuit processing. Raman spectroscopy offers a unique tool for phase identification at localized areas and mapping characterization of silicides with micrometespatial resolution. ©2000 The Electrochemical Society

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