The use of sputtering as a method for analysing surface chemical composition: A molecular dynamics study
- 1 April 1981
- journal article
- Published by Elsevier in Surface Science
- Vol. 105 (1) , 225-239
- https://doi.org/10.1016/0039-6028(81)90158-8
Abstract
No abstract availableKeywords
This publication has 14 references indexed in Scilit:
- Mechanisms of particle ejection from Cu(001) induced by the relative orientation of the bombarding primary ionThe Journal of Chemical Physics, 1980
- Classical trajectory calculations of the energy distribution of ejected atoms from ion bombarded single crystalsSurface Science, 1979
- Surface coverage measurements by sims for CO adsorption on a number of metals and for CO and H2S CO-adsorption on Ni(110), (100) and (111)Surface Science, 1979
- Molecular dynamics computer simulation of thin films of LiCl, NaCl, KCl and RbCl possessing (100) crystal–vacuum surfacesJournal of the Chemical Society, Faraday Transactions 2: Molecular and Chemical Physics, 1979
- Atomic and molecular ejection from ion-bombarded reacted single-crystal surfaces. Oxygen on copper(100)Physical Review B, 1978
- Formation of small metal clusters by ion bombardment of single crystal surfacesThe Journal of Chemical Physics, 1978
- Secondary-ion emission of amino acidsApplied Physics B Laser and Optics, 1976
- Computer simulation of the sputtering of clustersJournal of Applied Physics, 1976
- Measurements of Inelastic Energy Loss in Large-Angleon Ar Collisions at keV EnergiesPhysical Review B, 1962
- Dynamics of Radiation DamagePhysical Review B, 1960