Three-dimensional electron-beam lithography simulation

Publisher Website
Google Scholar
Abstract
A new model called ProBEAM/3D is introduced for the simulation of electron beam lithography. Monte Carlo simulations are combined with a beam shape to generate a single 'pixel' energy distribution. This pixel is then used to write a pattern by controlling the dose of every pixel on an address grid. The resulting dose pattern is used to expose and develop a resist to form a three-dimensional resist pattern.

This publication has 0 references indexed in Scilit: