Optimum scaling of buried-channel CCD's

Abstract
The maximum charge packet size in a two-phase charge-coupled device (CCD) is limited by many constraints relating to the transfer efficiency requirement and control circuit limitations. The constraints are quantified and an optimization routine is developed for designing CCD's with maximum charge capacity per unit area under these constraints. The optimum charge capacity for scaled down CCD's is calculated and it is shown that the normal buried channel cannot be designed to have adequate charge capacity at small geometries. A novel low-voltage buried-channel structure is introduced which uses a shallow p-type surface implant to minimize surface trapping and increases the charge capacity per unit area 2.4× compared to the normal buried channel. The optimum charge packet size at ∼1-µm geometry for these CCD structures, based on these calculations, is shown to be inadequate for VLSI dynamic memory applications.

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