Conduction mechanism in plasma-polymerized tetramethylsilane films
- 1 April 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 78 (2) , 125-132
- https://doi.org/10.1016/0040-6090(81)90611-8
Abstract
No abstract availableThis publication has 13 references indexed in Scilit:
- On the mechanism of electrical conduction in glow discharge polysilazane filmsThin Solid Films, 1978
- A New Transistor with Two‐Level Metal ElectrodesJournal of the Electrochemical Society, 1977
- Conduction dans les structures Al-SiO-AuThin Solid Films, 1973
- Aluminum oxide films made from evaporated sapphireThin Solid Films, 1972
- The Poole-Frenkel effectThin Solid Films, 1971
- The Poole-Frenkel constantThin Solid Films, 1971
- Electrical Properties of Vapor-Deposited Silicon Nitride and Silicon Oxide Films on SiliconJournal of the Electrochemical Society, 1968
- Current Transport and Maximum Dielectric Strength of Silicon Nitride FilmsJournal of Applied Physics, 1967
- Poole-Frenkel Effect and Schottky Effect in Metal-Insulator-Metal SystemsPhysical Review B, 1967
- Electrical Properties of Thin Polymer Films. Part I. Thickness 500–2500 ÅJournal of Applied Physics, 1964