Aligned multilayer structure generation by electron microprojection

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Abstract
Electron microprojection allows the fast transfer of structures with high resolution. Using a projector with a 1:4 image scale, a resolution of 0.3 μm across an 8×8 mm image field is experimentally obtained. The development of a novel alignment technique assures the superposition of several mask levels with an alignment accuracy better than 0.1 μm.

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