High-Conductivity p-Type Transparent Copper Aluminum Oxide Film Prepared by Plasma-Enhanced MOCVD

• 1 November 2000
• journal article
• research article
• Published by Wiley in Chemical Vapor Deposition
• Vol. 6  (6) , 285-288
• https://doi.org/10.1002/1521-3862(200011)6:6<285::aid-cvde285>3.3.co;2-b

Abstract

Keywords

• CONDUCTIVITY
• P‐TYPE
• HETEROMETALLIC OXIDES
• MOCVD
• PLASMA‐ENHANCED CVD