Low temperature CMOS devices and technology

• 1 January 1986
• proceedings article
• Published by Institute of Electrical and Electronics Engineers (IEEE)
• https://doi.org/10.1109/iedm.1986.191197

Abstract

Keywords

• CMOS TECHNOLOGY
• VERY LARGE SCALE INTEGRATION
• TEMPERATURE
• THERMAL CONDUCTIVITY
• ROOM TEMPERATURE
• GALLIUM ARSENIDE
• CMOS INTEGRATED CIRCUITS