Chemical vapor deposition precursor chemistry. 2. Formation of pure aluminum, alumina, and aluminum boride thin films from boron-containing precursor compounds by chemical vapor deposition
- 1 May 1992
- journal article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 4 (3) , 530-538
- https://doi.org/10.1021/cm00021a010
Abstract
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