Molecular hydrogen in electroless copper deposits
- 1 July 1986
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 60 (1) , 36-39
- https://doi.org/10.1063/1.337656
Abstract
Clusters of molecular hydrogen have been detected at a concentration of 930 ppm H2 in electroless Cu deposits using a new, nondestructive, calorimetric technique. The H2 is located in microvoids at a pressure of 700 atm at room temperature. The observation of H2 supports previous suggestions that it is responsible for the embrittlement of electroless Cu. Gentle annealing at 150 °C restores the ductility and also removes the H2.This publication has 8 references indexed in Scilit:
- Solidina-Si:H at low temperaturesPhysical Review B, 1985
- Solid Hydrogen in Hydrogenated Amorphous SiliconPhysical Review Letters, 1984
- Direct Experimental Evidence for Molecular Hydrogen in Amorphous Si: HPhysical Review Letters, 1984
- Ortho-para conversion of hydrogen in copper as origin of time-dependent heat leaksJournal of Low Temperature Physics, 1983
- Microstructure and ductility of electroless copper depositsActa Metallurgica, 1983
- The solid molecular hydrogens in the condensed phase: Fundamentals and static propertiesReviews of Modern Physics, 1980
- Precipitation and trapping of hydrogen in copperPhilosophical Magazine, 1976
- Hydrogen Embrittlement of Electroless Copper DepositsJournal of the Electrochemical Society, 1976