Characterization of TiSi2 Ohmic and Schottky Contacts Formed by Rapid Thermal Annealing Technology
- 1 January 1989
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 136 (1) , 238-241
- https://doi.org/10.1149/1.2096592
Abstract
No abstract availableThis publication has 0 references indexed in Scilit: