Four-Exposure Hologram Moiré Interferometry and Speckle-Pattern Interferometry: a Comparison
- 1 January 1975
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 14 (1) , 22-23
- https://doi.org/10.1364/ao.14.000022
Abstract
Optics InfoBase is the Optical Society's online library for flagship journals, partnered and copublished journals, and recent proceedings from OSA conferences.Keywords
This publication has 3 references indexed in Scilit:
- Four Exposure Holographic Moiré TechniqueApplied Optics, 1973
- Recording of In-plane Surface Displacement by Double-exposure Speckle PhotographyOptica Acta: International Journal of Optics, 1970
- Interferometric displacement measurement on scattering surfaces utilizing speckle effectJournal of Physics E: Scientific Instruments, 1970