Comparison of Transmission Electron Microscope Cross Sections of Amorphous Regions in Ion Implanted Silicon with Point‐Defect Density Calculations
- 1 December 1992
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 139 (12) , 3631-3638
- https://doi.org/10.1149/1.2069134
Abstract
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